Yong Hee Park
Assistant Engineer at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Image quality, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling, Algorithms

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Manufacturing, Control systems, Data processing, Raster graphics, Mask making, Computer aided design, Critical dimension metrology, Data conversion, Vestigial sideband modulation, Resolution enhancement technologies

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