Dr. Yong-Jin Chun
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Manufacturing, Image quality, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Polymers, Diffusion, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Instrument modeling

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Spatial light modulators, Image quality, Photomasks, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology, Stray light, Semiconducting wafers, Stereolithography

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Diffraction, Design for manufacturing, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Data modeling, Calibration, Scanners, Chromium, Computer simulations, Photomasks, Optical proximity correction, Virtual reality, Binary data

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Binary data, 3D image processing

Showing 5 of 8 publications
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