Dr. Yong-Jin Chun
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: SRAF, Photomasks, Manufacturing, Semiconducting wafers, Image quality, Lithography, Optical proximity correction, Tolerancing, Critical dimension metrology, Optimization (mathematics)

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical proximity correction, Photomasks, Diffusion, Printing, Critical dimension metrology, Instrument modeling, Statistical modeling, Optical lithography, Semiconducting wafers, Polymers

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Optical proximity correction, Nanoimprint lithography, Fiber optic illuminators, Image enhancement, Design for manufacturing, Critical dimension metrology, Semiconducting wafers, Lithography, Diffraction

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical proximity correction, Binary data, Photomasks, Chromium, Lithography, Data modeling, Computer simulations, Virtual reality, Scanners, Calibration

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical proximity correction, 3D modeling, Photomasks, Near field, Polarization, Chromium, 3D image processing, Transmittance, Binary data, Optical lithography

Showing 5 of 8 publications
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