Dr. Yong Liu
Principal Engineer at Nanotech Corp
SPIE Involvement:
Author
Area of Expertise:
GPU , simulation , calibration , Lithograpy , model , eda
Websites:
Publications (14)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Coherence imaging, Polarization, Matrices, Error analysis, Computer simulations, Photomasks, Cadmium sulfide, Optical proximity correction, Convolution, System on a chip

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Diffraction, Manufacturing, Inverse problems, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Diffraction, Inverse problems, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Manufacturing, Computer simulations, Photomasks, SRAF, Chemical elements, Tolerancing, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Vestigial sideband modulation, Inverse optics

Showing 5 of 14 publications
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