Yongdae Kim
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Publications (20)

Proceedings Article | 28 July 2014 Paper
Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose
Proceedings Volume 9256, 92560P (2014) https://doi.org/10.1117/12.2067566
KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482Q (2014) https://doi.org/10.1117/12.2046571
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

Proceedings Article | 6 April 2011 Paper
Proceedings Volume 7969, 79690Y (2011) https://doi.org/10.1117/12.879371
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Reflectivity, Extreme ultraviolet, Semiconducting wafers, Nanoimprint lithography, Printing, Optical lithography, Scanning electron microscopy

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 763614 (2010) https://doi.org/10.1117/12.846506
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Nanoimprint lithography, Critical dimension metrology, Extreme ultraviolet, Printing, Reflectivity, Silicon, Ruthenium

Proceedings Article | 11 May 2009 Paper
Kang Joon Seo, Ji Sun Ryu, Goo Min Jeong, Shin Cheol Kang, Yong Dae Kim, Sang Chul Kim, Chang Yeol Kim
Proceedings Volume 7379, 73791S (2009) https://doi.org/10.1117/12.824304
KEYWORDS: Pellicles, Photomasks, Air contamination, Transmittance, Contamination, Semiconducting wafers, Lithography, Inspection, Critical dimension metrology, Fluorine

Showing 5 of 20 publications
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