YongHa Lee
at Park Systems Corp
SPIE Involvement:
Publications (4)

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 868106 (2013) https://doi.org/10.1117/12.2011463
KEYWORDS: Atomic force microscopy, Process control, Metrology, Semiconductors, 3D metrology, Scatterometry, Lithography, Critical dimension metrology, Resolution enhancement technologies, Semiconducting wafers

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86812Y (2013) https://doi.org/10.1117/12.2013657
KEYWORDS: Line edge roughness, Photoresist materials, Atomic force microscopy, Line width roughness, Scanning electron microscopy, 3D image processing, 3D scanning, Scanners, Laser scanners, Semiconductors

Proceedings Article | 5 April 2012 Paper
Yueming Hua, Cynthia Buenviaje-Coggins, Yong-ha Lee, Sang-il Park
Proceedings Volume 8324, 83240I (2012) https://doi.org/10.1117/12.918377
KEYWORDS: Atomic force microscopy, Photoresist materials, 3D image processing, 3D metrology, 3D scanning, Image resolution, Laser scanners, Metrology, Line edge roughness, Scanners

Proceedings Article | 20 April 2011 Paper
Yueming Hua, Cynthia Buenviaje-Coggins, Yong-ha Lee, Jung-min Lee, Kyung-deuk Ryang, Sang-il Park
Proceedings Volume 7971, 797118 (2011) https://doi.org/10.1117/12.879545
KEYWORDS: Atomic force microscopy, Scanners, Photoresist materials, Critical dimension metrology, Line edge roughness, Line width roughness, Image resolution, Scanning electron microscopy, 3D metrology, Metrology

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