Mr. YongHa Lee
at Park Systems Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Metrology, Atomic force microscopy, Scatterometry, 3D metrology, Process control, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Scanners, Atomic force microscopy, Scanning electron microscopy, Laser scanners, Photoresist materials, Line width roughness, 3D scanning, Line edge roughness, 3D image processing

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Scanners, Image resolution, Atomic force microscopy, Laser scanners, Photoresist materials, 3D metrology, 3D scanning, Line edge roughness, 3D image processing

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Scanners, Image resolution, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, 3D metrology, Line width roughness, Critical dimension metrology, Line edge roughness

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top