Dr. Yongbae Kim Profile

Dr. Yongbae Kim

at Intel Corp

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 23 March 2012 Paper

50X, 75X mask cleaning effects on EUV lithography process and lifetime: lines and spaces, contacts, and LER

Brittany McClinton, Robert Chen, Simi George, Yongbae Kim, Lorie-Mae Baclea-an, Patrick Naulleau

Proceedings Volume 8322, 83223C (2012) https://doi.org/10.1117/12.918236

KEYWORDS: Photomasks, Line edge roughness, Extreme ultraviolet lithography, Mask cleaning, Reflectivity, Surface roughness, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet, Lithography

Read Abstract +

Proceedings Article | 14 October 2011 Paper

Effect of repetitive acid-based cleaning on EUV mask lifetime and lithographic performance

Robert Chen, Brittany McClinton, Simi George, Yongbae Kim, Lorie-Mae Baclea-an, Patrick Naulleau

Proceedings Volume 8166, 81661O (2011) https://doi.org/10.1117/12.896975

KEYWORDS: Photomasks, Extreme ultraviolet, Surface roughness, Lithography, Reflectivity, Line edge roughness, Critical dimension metrology, Electroluminescence, Atomic force microscopy, Extreme ultraviolet lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years