Dr. Yongfa Fan
Senior R&D Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (33)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Etching, Optical lithography, Optical proximity correction, Calibration, Reactive ion etching, Plasma, Plasma etching

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Computational lithography, Photoresist processing, Data modeling, Calibration, Cadmium, 3D modeling, Computer simulations, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: 3D modeling, Diffusion, Calibration, Data modeling, Lithography, Photoresist processing, Optical proximity correction, Etching, Lithographic illumination, Semiconducting wafers

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Calibration, Photomasks, 3D modeling, Lithography, Cadmium, Semiconducting wafers, Lithographic illumination, Process modeling, Error analysis, Light

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, 3D modeling, Data modeling, Optical proximity correction, Calibration, Polarization, Lithography, Performance modeling, Statistical modeling, 3D image processing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: 3D modeling, Data modeling, Etching, Optical proximity correction, Calibration, Lithography, Scanning electron microscopy, 3D image processing, Semiconducting wafers, Statistical modeling

Showing 5 of 33 publications
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