Dr. Yongfa Fan
Senior R&D Engineer at ASML
SPIE Involvement:
Publications (37)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508
KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12056, 1205607 (2022) https://doi.org/10.1117/12.2613926
KEYWORDS: Etching, Process modeling, Data modeling, Performance modeling, Optical proximity correction, Semiconducting wafers, Scanning electron microscopy, Calibration, Model-based design, Metrology

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 1160916 (2021) https://doi.org/10.1117/12.2584767
KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270B (2020) https://doi.org/10.1117/12.2552001
KEYWORDS: Etching, Metrology, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Critical dimension metrology, Performance modeling, Image processing, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
Yongfa Fan, Leiwu Zheng, Mu Feng, Jinze Wang, Qiao Zhao, Jen-Shiang Wang, Rafael Howell, Keith Gronlund
Proceedings Volume 10147, 101470Z (2017) https://doi.org/10.1117/12.2258702
KEYWORDS: Etching, Optical lithography, Optical proximity correction, Calibration, Reactive ion etching, Plasma, Plasma etching

Showing 5 of 37 publications
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