Dr. Yongfa Fan
Senior R&D Engineer at ASML Silicon Valley
SPIE Involvement:
Author
Publications (34)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Etching, Metrology, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Critical dimension metrology, Performance modeling, Image processing, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Etching, Optical lithography, Optical proximity correction, Calibration, Reactive ion etching, Plasma, Plasma etching

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Computational lithography, Photoresist processing, Data modeling, Calibration, Cadmium, 3D modeling, Computer simulations, Optical proximity correction, Semiconducting wafers

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: 3D modeling, Diffusion, Calibration, Data modeling, Lithography, Photoresist processing, Optical proximity correction, Etching, Lithographic illumination, Semiconducting wafers

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, 3D modeling, Data modeling, Optical proximity correction, Calibration, Polarization, Lithography, Performance modeling, Statistical modeling, 3D image processing

Showing 5 of 34 publications
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