Mr. Yongfa Huang
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Mathematical modeling, Metrology, Phase modulation, Scanners, Control systems, Process control, Optical alignment, Dynamical systems, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Ions, Silicon, Reflectivity, Scanning electron microscopy, Silicon films, Transmittance, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Metals, Manufacturing, Electroluminescence, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 6, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Etching, Image processing, Scanning electron microscopy, Line width roughness, Immersion lithography, Optical proximity correction, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Calibration, Manufacturing, Inspection, Finite element methods, Photomasks, Photoresist processing, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Single crystal X-ray diffraction

Showing 5 of 6 publications
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