Mr. YongKyoo Choi Profile

YongKyoo Choi

Executive Manager

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 20 March 2009

Evaluation of shadowing and flare effect for EUV tool

James Moon, Cheol-Kyun Kim, Byoung-Sub Nam, Byoung-Ho Nam, Yoon-Suk Hyun, Suk-Kyun Kim, Chang-Moon Lim, Yong-Dae Kim, Mun-Sik Kim, Yong-Kyoo Choi, Chang-Reol Kim, Donggyu Yim

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Lithography, Silicon, Light scattering, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

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Proceedings Article | 17 October 2008

The study of CD behavior due to transmission control position change within photomask substrate

Munsik Kim, Hyemi Lee, Sungha Woo, Kangjoon Seo, Yongkyoo Choi, Changyeol Kim

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Refractive index, Optical lithography, Quartz, Laser scattering, Control systems, Printing, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 19 May 2008

The study to optimize CD uniformity by reliable area CD measurement on 45nm D/R DRAM

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Spatial filters, Image processing, Error analysis, Scanning electron microscopy, Image filtering, Transmittance, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 19 May 2008

The source of carbon contamination for EUV mask production

Yongdae Kim, Junsik Lee, Yongkyoo Choi, Changreol Kim

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Carbon, Lithography, Contamination, Reflectivity, Raman spectroscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Analytical research

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Proceedings Article | 19 May 2008

An explosive haze formation under low energy exposure

Junsik Lee, Yongdae Kim, Yongkyoo Choi, Changreol Kim

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Packaging, Reticles, Air contamination, Ultraviolet radiation, Inspection, Raman spectroscopy, Organic materials, Pellicles, Photomasks, Explosives

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Proceedings Article | 2 May 2008

Design of pattern-specific mask grating for giving the effect of an off-axis illumination

Young-Seok Kim, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee, Seung Gol Lee

Proc. SPIE. 6792, 24th European Mask and Lithography Conference

KEYWORDS: Lithography, Optical design, Atrial fibrillation, Lithographic illumination, Quartz, Chromium, Photomasks

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Proceedings Article | 21 March 2008

EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proc. SPIE. 6921, Emerging Lithographic Technologies XII

KEYWORDS: Defect detection, Deep ultraviolet, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Defect inspection

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Proceedings Article | 1 November 2007

The study for close correlation of mask and wafer to optimize wafer field CD uniformity

Munsik Kim, Jaesung Kang, Shinchul Kang, Goomin Jeong, Yongkyoo Choi, Oscar Han

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Wafer-level optics, Quartz, Reliability, Optical testing, Scanning electron microscopy, Scatterometry, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 25 October 2007

Mask inspection method for 45nm node device

Sunghyun Oh, Yongkyoo Choi, Daeho Hwang, Goomin Jeong, Oscar Han

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Wafer-level optics, Inspection, Reflectivity, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Light, Defect inspection

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Proceedings Article | 15 May 2007

The optimization of CD uniformity and measurement on mask and wafer

Yongkyoo Choi, Munsik Kim, Oscar Han

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Optical lithography, Cadmium, Scanning electron microscopy, Image filtering, Transmittance, Photomasks, Image enhancement, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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Proceedings Article | 5 April 2007

The study to enhance the mask global CD uniformity by removing local CD variation

Yongkyoo Choi, Munsik Kim, Oscar Han

Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI

KEYWORDS: Optical lithography, Cadmium, Error analysis, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Scatter measurement

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Proceedings Article | 20 October 2006

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, Oscar Han

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Metrology, Anisotropic filtering, Scanning electron microscopy, Scatterometry, Time metrology, Image filtering, Photomasks, Critical dimension metrology, Line edge roughness, Anisotropic diffusion

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Proceedings Article | 20 October 2006

CD measurement evaluation on periodic patterns between optic tools and CD-SEM

Yongkyoo Choi, Munsik Kim, Sunghyun Oh, Oscar Han

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Wafer-level optics, Metrology, Deep ultraviolet, Calibration, Scanning electron microscopy, Scatterometry, Transmittance, Photomasks, Image enhancement, Critical dimension metrology

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Proceedings Article | 20 May 2006

The CD measuring repeatability enhancement by intensity gradient

Yongkyoo Choi, Sangpyo Kim, Munsik Kim, Oscar Han

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Anisotropic filtering, Image processing, Diffusion, Image resolution, Scanning electron microscopy, Image filtering, Photomasks, Image enhancement, Critical dimension metrology, Nonlinear filtering

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Proceedings Article | 24 March 2006

The study to enhance the accuracy of FIB repair on mask pattern of DRAM

Yongkyoo Choi, Heecheon Kim, Sangchul Kim, Oscar Han

Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX

KEYWORDS: Image processing, Diffusion, Feature extraction, Scanning electron microscopy, Image quality, Image filtering, Photomasks, Image enhancement, Raster graphics, Nonlinear filtering

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Proceedings Article | 5 November 2005

Image enhancement technology to get fine defect image for FIB

Yongkyoo Choi, Heecheon Kim, Oscar Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Defect detection, Image segmentation, Image processing, Diffusion, Inspection, Scanning electron microscopy, Image filtering, Photomasks, Image enhancement, Nonlinear filtering

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Proceedings Article | 6 December 2004

Mask defect inspection study with high-speed mask inspection system

Jeayoung Jun, Hyunchul Kim, Sungjin Choi, Yong Kyoo Choi, Oscar Han

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Defect detection, Particles, Nd:YAG lasers, Inspection, Chromium, Process control, Photomasks, Critical dimension metrology, Defect inspection

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Proceedings Article | 6 December 2004

Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition

Sang Pyo Kim, Sang Chul Kim, Hee Chun Kim, Sang Lee Lee, Yong Kyoo Choi, Oscar Han

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Carbon, Optical lithography, Quartz, Manufacturing, Inspection, Scanning electron microscopy, Printing, Photomasks, Photoresist processing, Semiconducting wafers

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Proceedings Article | 6 December 2004

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Contamination, Air contamination, Ultraviolet radiation, Ions, Atomic force microscopy, Oxygen, Transmission electron microscopy, Photomasks, Chemical analysis, Phase shifts

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Proceedings Article | 20 August 2004

Improvement of develop loading effect in the FEP-171 process

Tae-Joong Ha, Young-Mo Lee, Bo Choi, Yongkyoo Choi, Oscar Han

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Semiconductors, Quartz, Error analysis, Photomasks, Critical dimension metrology, Photoresist processing, Photomask technology, Standards development, Chemically amplified resists

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Proceedings Article | 17 December 2003

Mask patterning technology with KrF photomask repeater

Taejoong Ha, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Etching, Image processing, Chromium, Image registration, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, X-ray technology

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Proceedings Article | 17 December 2003

Cell projection EB exposure for Giga DRAM device mask

Jae Cheon Shin, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beams, Etching, Silicon, Chemistry, Silicon films, Photomasks, Beam shaping, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

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Proceedings Article | 26 June 2003

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proc. SPIE. 5040, Optical Microlithography XVI

KEYWORDS: Electron beam lithography, Contamination, Image processing, Image registration, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, X-ray technology

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Proceedings Article | 27 December 2002

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

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Proceedings Article | 30 July 2002

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proc. SPIE. 4691, Optical Microlithography XV

KEYWORDS: Electron beam lithography, Contamination, Coating, Distortion, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Photoresist processing, X-ray technology

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Proceedings Article | 11 March 2002

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Contamination, Coating, Image registration, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 22 January 2001

Develop process optimization for CD uniformity improvement

Jae-Cheon Shin, Joon-Il Won, Ho-Yong Jung, Mun-Sik Kim, Yong-Kyoo Choi, Oscar Han

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Optical lithography, Fluctuations and noise, Etching, Photomasks, Plasma etching, Mask making, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 22 January 2001

KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

Juhwan Kim, Sang-Chul Kim, Hee-Chun Kim, Sang-Lee Lee, Yong-Kyoo Choi, Young-Mog Ham, Oscar Han

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Optical lithography, Defect detection, Opacity, Quartz, Inspection, Printing, Photomasks, Semiconducting wafers, Defect inspection

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Proceedings Article | 25 August 1999

Stencil mask fabrication for cell projection e-beam lithography with silicon wafer

Jaeseung Choi, Seung-Ho Yi, Yongkyoo Choi, Hoon Huh, Jaejeong Kim

Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI

KEYWORDS: Oxides, Electron beam lithography, Etching, Dry etching, Silicon, Resistance, Photomasks, Wet etching, Mask making, Semiconducting wafers

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Proceedings Article | 7 July 1997

Optimal design of antireflective layer for DUV lithography and experimental results

Seung-Gol Lee, Kyung-Il Lee, Choong-Ki Seo, Jong-Ung Lee, Yongkyoo Choi, Byung-Ho Nam, Jeong Yu, Jae-Keun Jeong

Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV

KEYWORDS: Thin films, Lithography, Antireflective coatings, Optical lithography, Deep ultraviolet, Optical properties, Visualization, Reflectivity, Photoresist materials, Tolerancing

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Proceedings Article | 7 June 1996

More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation

Seung-Gol Lee, Kyung-Il Lee, Jong-Ung Lee, Yongkyoo Choi, Hong-Seok Kim

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Diffraction, Optical lithography, Dielectrics, Light scattering, Computer simulations, Photoresist materials, Optical simulations, Algorithm development, Diffraction gratings, Picture Archiving and Communication System

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Proceedings Article | 26 May 1995

Optical proximity correction on attenuated phase-shifting photo mask for dense contact array

Yongkyoo Choi, Young Jin Song, Hong-Seok Kim, Woo Kim

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Optical filters, Phase shifting, Optical lithography, Super resolution, Transmittance, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Phase shifts

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Showing 5 of 32 publications

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