YongKyoo Choi
Executive Manager
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 20 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Silicon, Light scattering, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Refractive index, Optical lithography, Quartz, Laser scattering, Control systems, Printing, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Spatial filters, Image processing, Error analysis, Scanning electron microscopy, Image filtering, Transmittance, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Carbon, Lithography, Contamination, Reflectivity, Raman spectroscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Analytical research

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Packaging, Reticles, Air contamination, Ultraviolet radiation, Inspection, Raman spectroscopy, Organic materials, Pellicles, Photomasks, Explosives

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Optical design, Atrial fibrillation, Lithographic illumination, Quartz, Chromium, Photomasks

Showing 5 of 32 publications
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