Yool Kang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (10)

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200R (2009) https://doi.org/10.1117/12.837341
KEYWORDS: Extreme ultraviolet lithography, Chromophores, Extreme ultraviolet, Lithography, Optical lithography, Optical transfer functions, Scanning electron microscopy, Electrons, Switches, Polymers

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6519, 651947 (2007) https://doi.org/10.1117/12.711951
KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing

Proceedings Article | 4 May 2005 Paper
Yool Kang, Jin Hong, Shi-Yong Lee, Hyung-Rae Lee, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599484
KEYWORDS: Etching, Line width roughness, Lithography, Silicon, Dry etching, Photomasks, Photoresist processing, Semiconducting wafers, Chemistry, Optical lithography

Proceedings Article | 28 May 2004 Paper
Sang-Wook Kim, Sung-Woo Lee, Chang-Min Park, Soo-Han Choi, Young-Mi Lee, Yool Kang, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536268
KEYWORDS: Optical proximity correction, Logic devices, Model-based design, Critical dimension metrology, Instrument modeling, Data modeling, Transistors, Resistance, Materials processing, Optical lithography

Proceedings Article | 12 June 2003 Paper
Hyun-Woo Kim, Yool Kang, Ju-Hyung Lee, Yun-Sook Chae, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485119
KEYWORDS: Vacuum ultraviolet, Etching, Scanning electron microscopy, Dry etching, Resistance, Line edge roughness, Critical dimension metrology, Inspection, Lithography, Particles

Showing 5 of 10 publications
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