Yool Kang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical transfer functions, Switches, Optical lithography, Polymers, Electrons, Scanning electron microscopy, Chromophores, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Reflectivity, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Chemistry, Photomasks, Line width roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Data modeling, Materials processing, Resistance, Transistors, Logic devices, Optical proximity correction, Critical dimension metrology, Model-based design, Instrument modeling

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Dry etching, Particles, Resistance, Inspection, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Vacuum ultraviolet

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Scanners, Chemistry, Manufacturing, Resistance, Scanning electron microscopy, Line edge roughness

Showing 5 of 10 publications
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