In order to meet the tightened lithography performance requirement for EUV systems, a good on-product focus control with accurate metrology is essential. In this manuscript we report on a novel metrology solution for the EUV on-product focus measurement using YieldStar. The new metrology has been qualified on the Logic product wafers and when combined with the advanced techniques and algorithm shows a performance that is accurate and precise enough to meet EUV requirements. Furthermore, the new methodology provides the opportunity for on-product focus monitoring and control through different scanner interfaces. Here we present a case in which the Imaging Optimizer using the EUV metrology data shows an improvement of over 20% on the focus uniformity.