Yorick Trouiller
Sr Director at ASELTA Nanographics
SPIE Involvement:
Publications (56)

Proceedings Article | 15 March 2012 Paper
Charlotte Beylier, Clement Moyroud, Fabrice Bernard Granger, Frederic Robert, Emek Yesilada, Yorick Trouiller, Jean-Claude Marin
Proceedings Volume 8327, 83270A (2012) https://doi.org/10.1117/12.916138
KEYWORDS: Optical proximity correction, Computer aided design, Design for manufacturing, Lithography, Databases, Metals, Manufacturing, Resolution enhancement technologies, Laser induced breakdown spectroscopy, Ions

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691P (2011) https://doi.org/10.1117/12.869830
KEYWORDS: Optical proximity correction, Detection and tracking algorithms, Computer simulations, Extreme ultraviolet, Genetic algorithms, Standards development, Photomasks, Extreme ultraviolet lithography, Lithography, Lanthanum

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7973, 79731Y (2011) https://doi.org/10.1117/12.881779
KEYWORDS: Zernike polynomials, Source mask optimization, Scanners, Image processing, Optical lithography, Photomasks, Distance measurement, Resolution enhancement technologies, Semiconducting wafers, Monochromatic aberrations

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730M (2011) https://doi.org/10.1117/12.879399
KEYWORDS: Photomasks, Double patterning technology, Lithography, Source mask optimization, Image acquisition, Diffraction, Geometrical optics, Optical lithography, Logic, Optical imaging

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730T (2011) https://doi.org/10.1117/12.870753
KEYWORDS: Lithography, Etching, Double patterning technology, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Photomasks, SRAF, Image processing, Logic

Showing 5 of 56 publications
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