Dr. Yorick Trouiller
Engineer at CEA Grenoble
SPIE Involvement:
Author
Publications (56)

Proceedings Article | 15 March 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Databases, Metals, Ions, Manufacturing, Laser induced breakdown spectroscopy, Design for manufacturing, Optical proximity correction, Computer aided design, Resolution enhancement technologies

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Genetic algorithms, Detection and tracking algorithms, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Lanthanum, Standards development

Proceedings Article | 5 April 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanners, Zernike polynomials, Distance measurement, Photomasks, Source mask optimization, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, SRAF, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Optical imaging, Lithography, Diffraction, Logic, Optical lithography, Image acquisition, Photomasks, Double patterning technology, Source mask optimization, Geometrical optics

Proceedings Article | 1 October 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Metals, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 56 publications
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