Yosef Avrahamov
Product Marketing Manager at KLA Israel
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 6 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Photoresist materials, Semiconducting wafers, Critical dimension metrology, Scatterometry, Semiconductors, Optical lithography, Photoresist processing, Reflectometry, Lithography, Chemistry

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Optical alignment, Time metrology, Databases, High volume manufacturing, Semiconductors, Intelligence systems, Image processing

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Immersion lithography, Statistical modeling, Optical lithography, Data modeling, Optical alignment, Reticles

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Overlay metrology, Metrology, Image segmentation, Front end of line, Semiconducting wafers, Chemical mechanical planarization, Metals, Lithography, Scanning electron microscopy, Scanners

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Aluminum, Overlay metrology, Process control, Etching, Semiconducting wafers, Data modeling, Lithography, Metrology, Sputter deposition, Metals

Showing 5 of 6 publications
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