Mr. Yoshi Hishiro Profile

Yoshi Hishiro

at JSR Micro Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 5 May 2017 Presentation

Presentation

Novel EUV photoresist for sub-7nm node (Conference Presentation)

Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai

Proceedings Volume 10143, 101430X (2017) https://doi.org/10.1117/12.2258164

KEYWORDS: Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, High volume manufacturing, Photoresist processing, Lithography, Semiconductor manufacturing, Semiconductors, Line edge roughness

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Proceedings Article | 6 April 2015 Paper

Paper

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, Tomohisa Fujisawa, Takakazu Kimoto, Motohiro Shiratani, Tomoki Nagai, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Toru Kimura

Proceedings Volume 9422, 94220P (2015) https://doi.org/10.1117/12.2085927

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Diffusion, Line width roughness, Lithography, Chemically amplified resists, Optical lithography, Chemical species, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 17 April 2014 Paper

Paper

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Takehiko Naruoka, Kenji Hoshiko, Motohiro Shiratani, Ken Maruyama, Ramakrishnan Ayothi, Yoshi Hishiro, Andreia Santos, Xavier Buch, Tooru Kimura

Proceedings Volume 9048, 90481D (2014) https://doi.org/10.1117/12.2046133

KEYWORDS: Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Fluorine, Semiconducting wafers, Diffusion, Chemical species, Line edge roughness, Absorbance

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Proceedings Article | 27 March 2014 Paper

Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Daniel Sanders, Carl Larson, Martin Glodde, Anuja DeSilva, Krishna Bajjuri

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

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Proceedings Article | 10 April 2013 Open Access

Open Access

Paper

The evolving complexity of patterning materials

Tsutomu Shimokawa, Yoshi Hishiro, Yoshikazu Yamaguchi, Motoyuki Shima, Tooru Kimura, Yoshio Takimoto, Tomoki Nagai

Proceedings Volume 8682, 868202 (2013) https://doi.org/10.1117/12.2014526

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Double patterning technology, Metals, Scanners, Oxides, Chemical elements, Lithography, Photomasks

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Proceedings Article | 10 April 2013 Paper

Paper

3D AFM method for characterization of resist effect of aerial image contrast on side wall roughness

Sang-Joon Cho, Sang-il Park, R. Ayothi, Y. Hishiro, Yong-ha Lee

Proceedings Volume 8681, 86812Y (2013) https://doi.org/10.1117/12.2013657

KEYWORDS: Line edge roughness, Photoresist materials, Atomic force microscopy, Line width roughness, Scanning electron microscopy, 3D image processing, 3D scanning, Scanners, Laser scanners, Semiconductors

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Proceedings Article | 29 March 2013 Paper

Paper

Novel EUV resist materials and process for 20nm half pitch and beyond

Ken Maruyama, Yoshi Hishiro, Motohiro Shiratani, Tooru Kimura, Ramakrishnan Ayothi, Koji Inukai

Proceedings Volume 8682, 86820B (2013) https://doi.org/10.1117/12.2011243

KEYWORDS: Extreme ultraviolet, Silicon, Absorption, Diffusion, Extreme ultraviolet lithography, Line width roughness, Lithography, Photomasks, Optical lithography, Scanning electron microscopy

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Proceedings Article | 26 March 2013 Paper

Paper

Polymer blends for directed self-assembly

Yuuji Namie, Shinya Minegishi, Tomoki Nagai, Yoshikazu Yamaguchi, Yusuke Anno, Takehiko Naruoka, Yoshi Hishiro

Proceedings Volume 8680, 86801M (2013) https://doi.org/10.1117/12.2011418

KEYWORDS: Polymers, Optical lithography, Photoresist materials, Annealing, Lithography, Materials processing, Photoresist developing, Directed self assembly, Interfaces, Photoresist processing

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Proceedings Article | 23 March 2012 Paper

Paper

Key parameters of EUV resists for contact hole applications

Yoshi Hishiro, Tooru Kimura, Hiroki Nakagawa, Kyoungyong Cho, Makoto Shimizu, Ken Maruyama

Proceedings Volume 8322, 83221B (2012) https://doi.org/10.1117/12.916837

KEYWORDS: Diffusion, Extreme ultraviolet, Lithography, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Chemically amplified resists, Photomasks, Lithographic illumination, Semiconducting wafers

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Proceedings Article | 20 March 2012 Paper

Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Tsutomu Shimokawa, Anuja DeSilva, Noel Arellano, Satoru Murakami, Yoshi Hishiro, Greg Breyta, Goji Wakamatsu, Yoshikazu Yamaguchi, Masayuki Motonari, Luisa Bozano, Kentaro Goto, Taiichi Furukawa, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 8 March 2012 Paper

Paper

EUV resist development for 16nm half pitch

Makoto Shimizu, Shalini Sharma, Tooru Kimura, Yoshi Hishiro, Hiroki Nakagawa, Ken Maruyama

Proceedings Volume 8325, 83250A (2012) https://doi.org/10.1117/12.916555

KEYWORDS: Diffusion, Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Immersion lithography, Optical lithography, Manufacturing, Photomasks, Silicon, Semiconducting wafers

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Proceedings Article | 16 April 2011 Paper

Paper

Ultra-thin-film EUV resists beyond 20nm lithography

Yoshi Hishiro, Kentaro Goto, Tomohisa Fujisawa, Tooru Kimura, Hiroki Nakagawa, Toshiyuki Kai

Proceedings Volume 7972, 79721I (2011) https://doi.org/10.1117/12.879303

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Etching, Diffusion, Semiconducting wafers, Line width roughness, Photoresist processing, Silica, Optical lithography

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Proceedings Article | 23 March 2010 Paper

Paper

Scissionable polymer resists for extreme ultraviolet lithography

Yoichi Ogata, James Blackwell, Yoshi Hishiro, Georgeta Masson

Proceedings Volume 7636, 763634 (2010) https://doi.org/10.1117/12.847320

KEYWORDS: Polymers, Extreme ultraviolet lithography, Polymerization, Lithography, Photoresist materials, Electron beam lithography, Thin films, Magnesium, Temperature metrology, Extreme ultraviolet

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Proceedings Article | 1 April 2009 Paper

Paper

Incorporating organosilanes into EUV photoresists: diphenyltrimethylsilylmethylsulfonium triflate as a new PAG

Clarion Tung, Yoshi Hishiro, Shalini Sharma, Arnold Rheingold, Yoichi Ogata, Todd Younkin, Joshua Figueroa, James Blackwell

Proceedings Volume 7273, 72733N (2009) https://doi.org/10.1117/12.814220

KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Optical transfer functions, Optical lithography, Photoresist materials, Semiconducting wafers, Chemistry, Extreme ultraviolet, Polymers, Lithography

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Proceedings Article | 4 April 2008 Paper

Paper

Characterization of resist and topcoat properties for immersion lithography

Yoshi Hishiro, Kaveri Jain

Proceedings Volume 6923, 692320 (2008) https://doi.org/10.1117/12.773318

KEYWORDS: Fluorine, Polymers, Surface roughness, Sulfur, Semiconducting wafers, Polymer thin films, Atomic force microscopy, Profiling, Immersion lithography, Nitrogen

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Proceedings Article | 23 March 2007 Paper

Paper

Thin bilayer resists for 193-nm and future photolithography II

Michael Hyatt, Yoshi Hishiro

Proceedings Volume 6519, 651935 (2007) https://doi.org/10.1117/12.712737

KEYWORDS: Scanning electron microscopy, Interferometers, Silicon, Scanners, Etching, Thin films, Lithographic illumination, Immersion lithography, Line edge roughness, Lithography

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Proceedings Article | 11 April 2006 Paper

Paper

Fundamental characterization of silicon-containing spin-on hardmask for 193nm photolithography

Mirzafer Abatchev, Yoshi Hishiro, Vishal Sipani

Proceedings Volume 6153, 61532U (2006) https://doi.org/10.1117/12.659102

KEYWORDS: Etching, Silicon, Plasmas, Chemical vapor deposition, Photoresist materials, Reflectivity, Oxides, Silicon carbide, Polymers, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

Paper

Thin bilayer resists approach for 193nm and future photolithography

Michael Hyatt, Yoshi Hishiro

Proceedings Volume 6153, 61532W (2006) https://doi.org/10.1117/12.659630

KEYWORDS: Silicon, Etching, Lithography, Thin films, Photoresist processing, Plasma, Carbon, FT-IR spectroscopy, Scanning electron microscopy, Oxidation

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Showing 5 of 18 publications

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