Yoshi Hishiro
at JSR Micro Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 5 May 2017 Presentation
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist processing

Proceedings Article | 6 April 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, Chemically amplified resists

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Semiconducting wafers

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Lithography, Optical lithography, Glasses, Resistance, Fourier transforms, Chemical vapor deposition, Photoresist materials, Photomasks

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Scanners, Atomic force microscopy, Scanning electron microscopy, Laser scanners, Photoresist materials, Line width roughness, 3D scanning, Line edge roughness, 3D image processing

Showing 5 of 18 publications
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