Yoshi Hishiro
Director, R&D at JSR Micro Inc
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, Chemically amplified resists

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Lithography, Optical lithography, Glasses, Resistance, Fourier transforms, Chemical vapor deposition, Photoresist materials, Photomasks

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Scanners, Photoresist materials, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Chemical elements

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Silicon, Diffusion, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption

Showing 5 of 17 publications
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