Yoshiaki Ogiso
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Lithography, Metrology, Error analysis, Reliability, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Distortion, Scanning electron microscopy, Data acquisition, Photomasks, Optical proximity correction, Data conversion, Algorithm development, Imaging arrays, Semiconducting wafers

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Cadmium, Scanning electron microscopy, Printing, Distance measurement, Software development, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Detection and tracking algorithms, Pattern recognition, Reflectivity, Scanning electron microscopy, Photomasks, Optical simulations, Beam shaping, Optical alignment, Critical dimension metrology, Algorithm development

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