Yoshiaki Yamada
Assistant Manager at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Silicon, Coating, Time metrology, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Liquids

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Optical lithography, Resistance, Extreme ultraviolet, Double patterning technology, Immersion lithography, Photoresist processing, Thin film deposition, 193nm lithography

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Etching, Ultraviolet radiation, Dielectrics, Silicon, Coating, Materials processing, Double patterning technology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 18 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Silica, Etching, Image processing, Photomasks, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tin

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Etching, Capillaries, Ions, Silicon, Scanning electron microscopy, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top