Yoshihide Kihara
at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11612, Advances in Patterning Materials and Processes XXXVIII
KEYWORDS: Lithographic illumination, Etching, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Optical lithography, Etching, Ions, Silicon, Atomic layer deposition, Photomasks, Plasma etching, Silicon carbide, Critical dimension metrology, Plasma

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Multilayers, Logic, Optical lithography, Etching, Process control, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

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