Yoshihiko Kajiya
at Ritsumeikan Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Fabrication, Lithography, Electron beam lithography, Mirrors, Electron beams, Logic, Statistical analysis, Very large scale integration, Photomasks, Electron beam direct write lithography

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Field programmable gate arrays, Photomasks, Multiplexers, Digital electronics, System on a chip, Standards development

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