Yoshihiro Fujimoto
at Nippon Control System Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Electronics, Metals, Manufacturing, Inspection, Parallel processing, Software development, Optical proximity correction, Data conversion, System on a chip, Vestigial sideband modulation

Proceedings Article | 12 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Electronics, Manufacturing, Inspection, Parallel processing, Software development, Design for manufacturing, Optical proximity correction, Data conversion, Prototyping, Vestigial sideband modulation

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