Mr. Yoshihiro Kondo
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Image processing, Particles, Diffusion, Line width roughness, Double patterning technology, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Etching, Error analysis, Diffusion, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resist chemistry, Fiber optic illuminators

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