Mr. Yoshihiro Saida
Staff Manager/SC Project at Showa Denko KK
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Electronics, Quartz, Diffusion, Resistance, Scanning electron microscopy, Photomasks, Thin film coatings, Photoresist processing, Phase shifts

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