Dr. Yoshihiro Tezuka
Sr. Technologist at Intel Kabushiki Kaisha
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Optical lithography, Electrodes, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Raster graphics, Overlay metrology, Vestigial sideband modulation

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Defect detection, Deep ultraviolet, Inspection, Optical inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 21 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beam lithography, Diffusion, Monte Carlo methods, Data processing, Photomasks, Optical proximity correction, Raster graphics, Computer aided design, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 16 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Cadmium, Image processing, Computer simulations, Transmission electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 15 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Statistical analysis, Coating, Chromium, Atomic force microscopy, Printing, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 13 publications
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