Yoshihiro Yamamoto
at Rohm and Haas Electronic Materials KK
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Etching, Coating, Reflectivity, Control systems, Photoresist processing, Standards development, Bottom antireflective coatings

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Optical lithography, Reflection, Etching, Polymers, Silicon, Reflectivity, Photoresist materials, Standards development

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Ions, Silicon, Reflectivity, Scanning electron microscopy, Silicon films, Transmittance, Photoresist processing, Semiconducting wafers

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