Yoshikazu Nagamura
Engineer at Renesas Technology Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (10)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Manufacturing, Defect inspection, Metals, Optical proximity correction, Inspection, Design for manufacturing, Software development, Error analysis, Semiconductors

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photomasks, Manufacturing, Inspection, Defect inspection, Metals, Optical proximity correction, Semiconducting wafers, Design for manufacturing, Materials processing, Image processing

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Computer aided design, Photomasks, Optical proximity correction, Manufacturing, Vestigial sideband modulation, Data conversion, Data analysis, Data processing, Computer simulations, Beam shaping

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Chromium, Semiconducting wafers, Critical dimension metrology, Photomasks, Inspection, Lithography, Defect inspection, Phase shifts, Control systems, Bridges

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Critical dimension metrology, Virtual reality, Image quality, Resolution enhancement technologies, Inspection, Manufacturing, Scanning electron microscopy

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Inspection, Picosecond phenomena, Chromium, Calibration, Semiconducting wafers, Defect inspection, Photomasks, Defect detection, Critical dimension metrology, Phase shifts

Showing 5 of 10 publications
Conference Committee Involvement (2)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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