Yoshinori Hagio
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beams, Inspection, Scanning electron microscopy, Optical inspection, Wafer inspection, Photomasks, Mask making, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Double patterning technology, Reactive ion etching, Semiconducting wafers

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