Yoshinori Momonoi
General Manager at Hitachi High-Tech Corporation
SPIE Involvement:
Publications (12)

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11147, 111471A (2019) https://doi.org/10.1117/12.2535664
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Critical dimension metrology, Inspection, Optical inspection, Chemical reactions, Monte Carlo methods, Photomasks, Semiconducting wafers, Ranging

SPIE Journal Paper | 3 May 2019 Open Access
JM3, Vol. 18, Issue 02, 024002, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024002
KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

Proceedings Article | 29 March 2019 Presentation + Paper
Proceedings Volume 10959, 1095914 (2019) https://doi.org/10.1117/12.2514697
KEYWORDS: Metrology, Extreme ultraviolet, Image processing, Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Process control, Lithography, Error analysis

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591D (2019) https://doi.org/10.1117/12.2514797
KEYWORDS: Extreme ultraviolet, Monte Carlo methods, Critical dimension metrology, Line edge roughness, Electrons, Spatial resolution, Extreme ultraviolet lithography, Metrology, Scanning electron microscopy

Showing 5 of 12 publications
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