Yoshinori Momonoi
Senior Engineer at Hitachi High-Tech Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Inspection, Optical inspection, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Ranging

SPIE Journal Paper | 3 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

Proceedings Article | 29 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Error analysis, Scanning electron microscopy, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Electrons, Scanning electron microscopy, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Spatial resolution, Critical dimension metrology, Line edge roughness

Showing 5 of 12 publications
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