Yoshinori Momonoi
Senior engineer at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (10)

SPIE Journal Paper | 3 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

Proceedings Article | 29 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Error analysis, Scanning electron microscopy, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Electrons, Scanning electron microscopy, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Spatial resolution, Critical dimension metrology, Line edge roughness

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

SPIE Journal Paper | 29 June 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering

Showing 5 of 10 publications
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