Yoshinori Ohsaki
at Canon Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Metrology, Jones matrices, Polarization, Birefringence, Image processing, Wavefront aberrations, Distortion, Laser induced plasma spectroscopy, Projection systems, Optical simulations

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Monochromatic aberrations, Aberration correction, Metrology, Optical properties, Sensors, Wavefront aberrations, Control systems, Projection systems, Optics manufacturing

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Light sources, Reticles, Interferometers, Wavefront aberrations, Projection systems, Spatial coherence, Charge-coupled devices, Semiconducting wafers, Fiber optic illuminators

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