Dr. Yoshio Gomei Profile

Dr. Yoshio Gomei

Senior Scientist at Canon Inc

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 21 March 2007 Paper

Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Yasuaki Fukuda

Proceedings Volume 6517, 651731 (2007) https://doi.org/10.1117/12.711364

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Bioalcohols, Extreme ultraviolet lithography, Protactinium, Ruthenium, Carbon, Oxygen, Oxidation

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Proceedings Article | 21 March 2007 Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. Fukuda

Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 15 March 2007 Paper

EUVL mask dual pods to be used for mask shipping and handling in exposure tools

Yoshio Gomei, Kazuya Ota, John Lystad, Dave Halbmair, Long He

Proceedings Volume 6517, 65170W (2007) https://doi.org/10.1117/12.711296

KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Particle contamination, Semiconducting wafers, Pellicles, Prototyping, Lithography, Quartz, Ultraviolet radiation

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Proceedings Article | 24 March 2006 Paper

Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089

KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

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Proceedings Article | 24 March 2006 Paper

New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it

Masahito Niibe, Yukinobu Kakutani, Shigeru Terashima, Hiromitsu Takase, Yoshio Gomei, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

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Proceedings Article | 23 March 2006 Paper

Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

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Proceedings Article | 22 March 2006 Paper

Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd Decker, Michael Johnson, Donald Phillion, John Taylor

Proceedings Volume 6151, 61510E (2006) https://doi.org/10.1117/12.656275

KEYWORDS: Wavefronts, Interferometers, Polarization, Optical testing, Calibration, Monochromatic aberrations, Visible radiation, Extreme ultraviolet lithography, Near field optics, Zernike polynomials

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Proceedings Article | 18 August 2005 Paper

Calibration of symmetric and non-symmetric errors for interferometry of ultra-precise imaging systems

Donald Phillion, Gary Sommargren, Michael Johnson, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690R (2005) https://doi.org/10.1117/12.623187

KEYWORDS: Wavefronts, Interferometers, Optical testing, Calibration, Mirrors, Spherical lenses, Interferometry, Phase interferometry, Extreme ultraviolet lithography, CCD cameras

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Proceedings Article | 18 August 2005 Paper

Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems

Michael Johnson, Donald Phillion, Gary Sommargren, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690P (2005) https://doi.org/10.1117/12.623185

KEYWORDS: Wavefronts, Mirrors, Extreme ultraviolet lithography, Calibration, Silicon, Metrology, Charge-coupled devices, Polarization, Cameras, Monochromatic aberrations

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Proceedings Article | 6 May 2005 Paper

Characterization of capped multilayer mirrors using XPS, AES, and SIMS

Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima, Hiroyuki Kondo, Takashi Aoki, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600452

KEYWORDS: Ruthenium, Silicon, Carbon, Extreme ultraviolet lithography, Protactinium, Molybdenum, Mirrors, Oxides, Chemical analysis, Oxidation

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Proceedings Article | 6 May 2005 Paper

Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

Yukinobu Kakutani, Masahito Niibe, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599577

KEYWORDS: Reflectivity, Extreme ultraviolet, Carbon, Protactinium, Mirrors, Extreme ultraviolet lithography, Chemical species, Oxygen, Optical filtering, Oxidation

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Proceedings Article | 6 May 2005 Paper

Apparatus for contamination control development in EUVA

Takashi Aoki, Hiroyuki Kondo, Shuichi Matsunari, Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600488

KEYWORDS: Carbon, Protactinium, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Mirrors, Oxygen, Ruthenium, Oxides, Oxidation

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Proceedings Article | 18 October 2004 Paper

A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Yukinobu Kakutani, Masahito Niibe, Kazuya Kakiuchi, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559395

KEYWORDS: Reflectivity, Mirrors, Protactinium, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Optical testing, Absorption, Oxygen, Gases

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Proceedings Article | 24 December 2002 Paper

Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation

Masahito Niibe, Mikihito Mukai, Takeshi Tanaka, Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei

Proceedings Volume 4782, (2002) https://doi.org/10.1117/12.451354

KEYWORDS: Monochromators, Mirrors, Optical testing, Photons, Extreme ultraviolet, Diffraction, Diffraction gratings, EUV optics, Interferometry, Charge-coupled devices

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Proceedings Article | 1 July 2002 Paper

ASET development of at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472344

KEYWORDS: Wavefronts, Optical testing, Mirrors, Extreme ultraviolet, Photomasks, Visible radiation, Monochromatic aberrations, Phase shifts, Point diffraction interferometers, Diffraction

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Proceedings Article | 20 December 2001 Paper

Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Yoshio Gomei, Katsumi Sugisaki, Yucong Zhu, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450962

KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Phase shifts, Mirrors, Fringe analysis, CCD cameras, Point diffraction interferometers, Optical testing, Tantalum

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Proceedings Article | 8 November 2000 Paper

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406675

KEYWORDS: Visible radiation, Extreme ultraviolet, Mirrors, Wavefronts, Interferometers, Information technology, Interferometry, Point diffraction interferometers, Phase shifts, Optical testing

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Proceedings Article | 21 July 2000 Paper

Overview of ASET PXL and EUVL programs in Japan

Yoshio Gomei

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390032

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, X-rays, Photoresist processing, Lithography, Optical alignment, Tantalum, Mask making, Image processing

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Proceedings Article | 25 June 1999 Paper

Cost analysis on the next-generation lithography technology

Yoshio Gomei

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351075

KEYWORDS: Photomasks, Extreme ultraviolet, X-rays, Charged-particle lithography, Lithography, Semiconducting wafers, Electron beams, X-ray lithography, Photoresist processing, Ions

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Proceedings Article | 24 July 1996 Paper

Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement

Kinya Ashikaga, Shinji Tsuboi, Yoshio Yamashita, Shinji Sugihara, Yoshio Gomei, Tsutomu Shoki, Yoichi Yamaguchi, Tsuneaki Ohta

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245200

KEYWORDS: X-rays, Tantalum, Photomasks, Silicon, Semiconducting wafers, Silicon carbide, Oxygen, Electron beams, Photoresist processing, Sputter deposition

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Proceedings Article | 3 November 1994 Paper

Analysis of mask distortion induced by heating during e-beam writing

Alberto Moel, Yoshio Gomei

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191931

KEYWORDS: Distortion, X-rays, Photomasks, X-ray optics, X-ray technology, Diffusion, Silicon carbide, Radiative energy transfer, Electrons, Finite element methods

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Proceedings Article | 9 July 1992 Paper

Study of single-layer e-beam lithography for x-ray mask making

Yukiko Kikuchi, Yuji Takigami, Ichiro Mori, Yoshio Gomei

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136010

KEYWORDS: X-ray lithography, X-rays, Scattering, Electron beam lithography, Electrons, Silicon, Mask making, Photomasks, Laser scattering, Reactive ion etching

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Showing 5 of 22 publications

Conference Committee Involvement (2)

Emerging Lithographic Technologies VIII

24 February 2004 | Santa Clara, California, United States

Emerging Lithographic Technologies VII

25 February 2003 | Santa Clara, California, United States

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