Dr. Yoshio Gomei
Senior Scientist at Canon Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (22)

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Carbon, Lithography, Mirrors, Gases, Reflectivity, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Natural surfaces, Protactinium

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Carbon, Mirrors, Reflectivity, Bioalcohols, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Protactinium, Oxidation

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Quartz, Ultraviolet radiation, Particles, Pellicles, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Particle contamination, Prototyping

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Oxides, Mirrors, Silicon, Diffusion, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Protactinium, Oxidation

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Carbon, Mirrors, Contamination, In situ metrology, Reflectivity, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Protactinium, Absorption

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Carbon, Lithography, Mirrors, Reflectivity, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Atmospheric optics, Protactinium, Oxidation

Showing 5 of 22 publications
Conference Committee Involvement (2)
Emerging Lithographic Technologies VIII
24 February 2004 | Santa Clara, California, United States
Emerging Lithographic Technologies VII
25 February 2003 | Santa Clara, California, United States
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