Yoshio Tanaka
Executive Emeritus
SPIE Involvement:
Publications (4)

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504209
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Critical dimension metrology, Virtual reality, Image quality, Resolution enhancement technologies, Inspection, Manufacturing, Scanning electron microscopy

Proceedings Article | 3 July 1995 Paper
Taro Saito, Hideyuki Jinbo, K. Yano, Seki Suzuki, Yoshio Tanaka
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212802
KEYWORDS: Edge roughness, Photomasks, Wet etching, Semiconducting wafers, Phase shifts, Manufacturing, Computer simulations, Electron beams, Image processing, Dry etching

Proceedings Article | 3 November 1994 Paper
Katsuhiro Takushima, Hideyuki Jinbo, Taro Saito, Itsuji Ashida, Yoshio Tanaka
Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191950
KEYWORDS: Phase shifts, Quartz, Laser energy, Information operations, Gallium, Photomasks, Nd:YAG lasers, Etching, X-ray technology, Ions

Proceedings Article | 15 February 1994 Paper
Taro Saito, Hideyuki Jinbo, Katsuhiro Takushima, Itsuji Ashida, Yoshio Tanaka
Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167281
KEYWORDS: Photomasks, Quartz, Phase shifting, Phase shifts, Etching, Photomicroscopy, Reticles, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

Proceedings Volume Editor (1)

Conference Committee Involvement (5)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
Symposium on Photomask and X-Ray Mask Technology
18 April 1996 | Kawasaki City, Japan
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