Yoshio Tanaka
VP Business Development at D2S KK
SPIE Involvement:
Conference Co-Chair | Symposium Committee | Conference Program Committee | Symposium Chair | Author
Publications (5)

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Manufacturing, Inspection, Scanning electron microscopy, Image quality, Photomasks, Critical dimension metrology, Virtual reality, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | July 3, 1995
Proc. SPIE. 2512, Photomask and X-Ray Mask Technology II
KEYWORDS: Electron beams, Dry etching, Image processing, Manufacturing, Computer simulations, Photomasks, Wet etching, Semiconducting wafers, Edge roughness, Phase shifts

PROCEEDINGS ARTICLE | November 3, 1994
Proc. SPIE. 2254, Photomask and X-Ray Mask Technology
KEYWORDS: Etching, Quartz, Laser energy, Ions, Nd:YAG lasers, Photomasks, Gallium, X-ray technology, Information operations, Phase shifts

PROCEEDINGS ARTICLE | February 15, 1994
Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Reticles, Phase shifting, Etching, Quartz, Scanning electron microscopy, Photomasks, Photomicroscopy, Photoresist processing, Semiconducting wafers, Phase shifts

Conference Committee Involvement (5)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
Symposium on Photomask and X-Ray Mask Technology
18 April 1996 | Kawasaki City, Japan
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