Dr. Yoshiomi Hiroi
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Silica, Etching, Chemical species, Polymers, Ions, Silicon, Manufacturing, Boron, Photoresist processing

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Polymers, Reflectivity, Scanning electron microscopy, Chromophores, Double patterning technology, Immersion lithography, Critical dimension metrology, Thin film coatings, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Interfaces, Silicon, Diffusion, Reflectivity, Photoresist processing, Semiconducting wafers, Carbon monoxide, Industrial chemicals, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Optical lithography, Contamination, Reflection, Polymers, Silicon, Immersion lithography, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Reflectivity, Photomasks, Immersion lithography, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings, Absorption

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Sensors, Etching, Polymers, Silicon, Reflectivity, Control systems, Photoresist materials, Polymerization, Semiconducting wafers

Showing 5 of 7 publications
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