Yoshiyuki Kono
at Litho Tech Japan Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Infrared imaging, FT-IR spectroscopy, Sensors, Silicon, Optical testing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | April 12, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Light sources, Imaging systems, Scanners, Manufacturing, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Floods

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Data modeling, Silicon, Diffusion, Manufacturing, Photoresist materials, Epoxies, Semiconducting wafers, Temperature metrology, Absorption

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microelectromechanical systems, Lithography, FT-IR spectroscopy, Optical lithography, Ultraviolet radiation, Coating, Epoxies, Photoresist processing, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Quartz, Ultraviolet radiation, Coating, Polymerization, Extreme ultraviolet, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: FT-IR spectroscopy, Data modeling, Spectroscopy, Diffusion, 3D modeling, Solids, Semiconducting wafers, Systems modeling, Liquids, Chemically amplified resists

Showing 5 of 6 publications
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