Yoshiyuki Kono
at Litho Tech Japan Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Infrared imaging, FT-IR spectroscopy, Sensors, Silicon, Optical testing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Light sources, Imaging systems, Scanners, Manufacturing, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Floods

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Data modeling, Silicon, Diffusion, Manufacturing, Photoresist materials, Epoxies, Semiconducting wafers, Temperature metrology, Absorption

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microelectromechanical systems, Lithography, FT-IR spectroscopy, Optical lithography, Ultraviolet radiation, Coating, Epoxies, Photoresist processing, Standards development, Temperature metrology

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Quartz, Ultraviolet radiation, Coating, Polymerization, Extreme ultraviolet, Photoresist processing, Liquids

Showing 5 of 6 publications
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