Yoshiyuki Tanaka
Sr. Researcher at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Opacity, Etching, Scanning electron microscopy, Data processing, Process control, Transmittance, Photomasks, Computer aided design, CAD systems

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Sensors, Etching, Quartz, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Visibility

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Opacity, Quartz, Ions, Monte Carlo methods, Transmittance, Photomasks, Gallium, Binary data, 193nm lithography

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Opacity, Etching, Control systems, Atomic force microscopy, Photomasks, Computer aided design, Acoustics, Surface conduction electron emitter displays, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Imaging systems, Etching, Chromium, Control systems, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

Showing 5 of 10 publications
Conference Committee Involvement (1)
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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