Yosias Melaku
at Lam Research Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 14 June 1996 Paper
Proc. SPIE. 2724, Advances in Resist Technology and Processing XIII
KEYWORDS: Interferometers, Etching, Ions, Oxygen, Scanning electron microscopy, Photomasks, Plasma etching, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 16 April 1993 Paper
Proc. SPIE. 1803, Advanced Techniques for Integrated Circuit Processing II
KEYWORDS: Radon, Etching, Ions, Silicon, Adaptive optics, Chlorine, Molybdenum, Selenium, Information operations, Plasma

Proceedings Article | 1 March 1991 Paper
Proc. SPIE. 1392, Advanced Techniques for Integrated Circuit Processing
KEYWORDS: Etching, Dry etching, Electrodes, Magnetism, Oxygen, Integrated circuits, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Plasma

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