Yosuke Kojima
Manager at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 12 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Photomasks, Lithography, 193nm lithography, Phase shifts, Semiconducting wafers, Nanoimprint lithography, Image enhancement, Critical dimension metrology, Mask making, Dry etching

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography, Photoresist processing, Reticles, Metrology, Radium, Semiconductors

Proceedings Article | 17 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Scanners, Reticles, Critical dimension metrology, Airborne remote sensing, Optical proximity correction, Phase shifts, Integrated circuit design

Proceedings Article | 16 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Lithography, Metrology, Scatterometry, Immersion lithography, Logic

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Lithography, Metrology, Calibration, Airborne remote sensing, 3D metrology

Showing 5 of 21 publications
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