Yosuke Shirata
at Nikon Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Reticles, Optical parametric oscillators, Scanners, Wavefronts, Distortion, Software development, Transmittance, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Reticles, Data modeling, Calibration, Scanners, Wavefronts, Control systems, Distortion, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Sensors, Scanners, Manufacturing, Distortion, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Cooling systems, Lithography, Reticles, Scanners, Distortion, Semiconductor manufacturing, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Interferometers, Calibration, Scanners, Control systems, Distortion, Computer programming, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Glasses, Scanners, Scanning electron microscopy, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top