Mr. You Arisawa Profile

You Arisawa

at SCREEN Semiconductor Solutions Co Ltd

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Author

Publications (7)

Proceedings Article | 20 September 2020 Presentation

High sensitivity non-CAR type hemicellulose resists for EUV Lithography

Kazuyo Morita, Kimiko Yamamoto, Yasuaki Tanaka, Hiroki Tanaka, Masahiko Harumoto, Yuji Tanaka, Chisayo Mori, You Arisawa, Tomohiro Motono, Harold Stokes, Masaya Asai

Proceedings Volume 11517, 115170E (2020) https://doi.org/10.1117/12.2572769

KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Stochastic processes, Polymers, Photoresist processing, Silicon, Semiconducting wafers, Process control, Structural design

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Proceedings Article | 23 March 2020 Paper

Application of alternative developer solutions for EUV lithography

Julius Joseph Santillan, Masahiko Harumoto, Harold Stokes, Chisayo Mori, Yuji Tanaka, You Arisawa, Tomohiro Motono, Masaya Asai, Toshiro Itani

Proceedings Volume 11323, 113231W (2020) https://doi.org/10.1117/12.2551891

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Optical lithography, Semiconductors, Lithography

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Proceedings Article | 23 March 2020 Paper

High sensitivity non-CAR resists for EUV and EB lithography

Kazuyo Morita, Kimiko Yamamoto, Masahiko Harumoto, Yuji Tanaka, Chisayo Mori, You Arisawa, Tomohiro Motono, Harold Stokes, Masaya Asai

Proceedings Volume 11326, 113260C (2020) https://doi.org/10.1117/12.2551476

KEYWORDS: Photoresist processing, Extreme ultraviolet lithography, Metals, Lithography, Extreme ultraviolet, Photoresist materials

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Proceedings Article | 23 March 2020 Paper

Expanding DSA process window with atmospheric control

Nathalie Frolet, Maxime Argoud, Charlotte Bouet, Karine Jullian, Yuji Tanaka, Chisayo Mori, You Arisawa, Tomohiro Motono, Masahiko Harumoto, Harold Stokes, Masaya Asai, Raluca Tiron

Proceedings Volume 11326, 113261J (2020) https://doi.org/10.1117/12.2561259

KEYWORDS: Oxygen, Annealing, Directed self assembly, Control systems, Materials processing, Oxidation

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Proceedings Article | 4 June 2019 Paper

Litho-performance expansion with new SOC made from Hemicellulose

Masahiko Harumoto, Yuji Tanaka, Chisayo Nakayama, You Arisawa, Masaya Asai, Charles Pieczulewski, Harold Stokes, Kimiko Yamamoto, Hiroki Tanaka, Yasuaki Tanaka, Kazuyo Morita

Proceedings Volume 10957, 109571V (2019) https://doi.org/10.1117/12.2517692

KEYWORDS: System on a chip, Silicon, Etching, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, Photoresist developing, Scanning electron microscopy, Antireflective coatings

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Proceedings Article | 25 March 2019 Paper

Improved hemicellulose spin on carbon hardmask

Kazuyo Morita, Kimiko Yamamoto, Hiroki Tanaka, Yasuaki Tanaka, Masahiko Harumoto, Yuji Tanaka, Chisayo Nakayama, You Arisawa, Tomohiro Motono, Harold Stokes, Masaya Asai, Charles Pieczulewski

Proceedings Volume 10960, 109601A (2019) https://doi.org/10.1117/12.2514915

KEYWORDS: System on a chip, Reactive ion etching, Image processing, Extreme ultraviolet, Carbon, Scanning electron microscopy, Optical lithography, Etching, Semiconducting wafers, Logic devices

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Proceedings Article | 28 March 2018 Paper

New spin on carbon materials made from hemicellulose for hardmask layer

Kazuyo Morita, Kimiko Yamamoto, Koki Hongo, Masahiko Harumoto, Yuji Tanaka, Chisayo Nakayama, You Arisawa, Harold Stokes, Masaya Asai

Proceedings Volume 10586, 105860M (2018) https://doi.org/10.1117/12.2297333

KEYWORDS: Carbon, System on a chip, Etching, Resistance, Thin film coatings, Reactive ion etching, Semiconducting wafers, Silicon, Photomasks, Coating

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Showing 5 of 7 publications

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