YouJin Kim
Technologist at AMAT
SPIE Involvement:
Area of Expertise:
Metrology , SEM , ALD , CDSEM
Profile Summary

Started working in the semiconductor industry in 2003 and worked for ALD process related in Korean company about 8years. Since 2011, joined applied materials mainly work for SEM metrology as Technologist.
Publications (6)

Proceedings Article | 16 April 2024 Presentation + Paper
Il Hwan Kim, Cheolgyu Hyun, Sangho Jo, Muyoung Lee, Ikjun Jang, Jongsu Kim, Jinhong Park, Yigwon Kim, Chang Min Park, Kevin Houchens, Jenny Perry, Nahum Bomshtein, Liad Anokov, Noam Oved, Uri Smolyan, Michael Shifrin, Tal Itzkovich, Jeong Ho Yeo, You Jin Kim, Baek Jun Kim
Proceedings Volume 12955, 129551I (2024)
KEYWORDS: Design, Scanning electron microscopy, Overlay metrology, Monte Carlo methods, Electrons, Lithography, Precision measurement, Electron beam lithography, Design rules, Signal detection

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295517 (2024)
KEYWORDS: Shrinkage, Etching, Extreme ultraviolet, Photoresist materials, Metrology, Semiconducting wafers, Extreme ultraviolet lithography, Photoacid generators, Stochastic processes, Critical dimension metrology

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550N (2024)
KEYWORDS: Metrology, Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metals, High volume manufacturing, Contour extraction, Computer aided design, Design

Proceedings Article | 27 April 2023 Presentation + Paper
Sangho Jo, Jongsu Kim, Youngsik Park, Muyoung Lee, Jinhong Park, Changmin Park, Jeong-Ho Yeo, Yaniv Abramovitz, You Jin Kim, Asaf Shoham, Shmuel Ben Nissim
Proceedings Volume 12496, 124960K (2023)
KEYWORDS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Scanners, Optical parametric oscillators, Measurement devices, Lithography, Error control coding, Optical alignment, Metrology

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 1249622 (2023)
KEYWORDS: Shrinkage, Photoresist materials, Extreme ultraviolet lithography, Critical dimension metrology, Photoacid generators, Metrology, Extreme ultraviolet, Etching, Electron beams, Outgassing

Showing 5 of 6 publications
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