Dr. Young-Chang Kim
at Siemens EDA
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295516 (2024) https://doi.org/10.1117/12.3010898
KEYWORDS: Optical proximity correction, Metrology, Modeling, Extreme ultraviolet, Scanning electron microscopy, Shrinkage, Contour extraction, Signal to noise ratio, EUV optics

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205605 (2022) https://doi.org/10.1117/12.2614280
KEYWORDS: Etching, Reactive ion etching, Optical proximity correction, Neural networks, Machine learning, Ions

Proceedings Article | 23 March 2020 Presentation + Paper
Yuansheng Ma, Le Hong, James Word, Fan Jiang, Vlad Liubich, Liang Cao, Srividya Jayaram, Doohwan Kwak, YoungChang Kim, Germain Fenger, Ananthan Raghunathan, Joerg Mellmann
Proceedings Volume 11329, 1132909 (2020) https://doi.org/10.1117/12.2551703
KEYWORDS: Machine learning, Optical proximity correction, Photomasks, Etching, Data modeling, Process modeling, Neural networks, Semiconducting wafers, Inspection

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 1132507 (2020) https://doi.org/10.1117/12.2551082
KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Metals, Metrology, Critical dimension metrology, Databases, Inspection, Computer simulations, Scanners

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10962, 109620B (2019) https://doi.org/10.1117/12.2516101
KEYWORDS: Failure analysis, Critical dimension metrology, Lithography, Logic, Manufacturing, Photomasks, Error analysis, Stochastic processes, Visualization, Optical proximity correction

Showing 5 of 32 publications
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