Dr. Young-Chang Kim
at Mentor Graphics Korea Co Inc
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Metals, Machine learning, Optical proximity correction, Convolution, Statistical modeling, Mahalanobis distance

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Data modeling, Calibration, Atomic force microscopy, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Data conversion, Optical calibration, Instrument modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beams, Error analysis, Monte Carlo methods, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design, 193nm lithography

Showing 5 of 28 publications
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