Young-Doo Jeon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Diffraction, Optical lithography, Data modeling, Optical properties, Bridges, Photomasks, Semiconductor manufacturing, Optical proximity correction, Process modeling

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Multilayers, Germanium, Reflectivity, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Absorption

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