Young-Hong Min
Sr. Application Specialist at ASML Korea Co Ltd
SPIE Involvement:
Publications (11)

Proceedings Article | 13 March 2012 Paper
Jens Neumann, Jongsu Lee, Kiho Yang, Byounghoon Lee, Taehyeong Lee, Jeongsu Park, Chang-moon Lim, Donggyu Yim, Sungki Park, Eric Janda, Kaustuve Bhattacharyya, Chan-ho Ryu, Young-Hong Min, Kiki Rhe, Bernd Geh
Proceedings Volume 8326, 832602 (2012)
KEYWORDS: Overlay metrology, Diffraction, Data modeling, Metrology, Diffraction gratings, Lithography, Semiconducting wafers, Inspection, Printing, Computer simulations

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76400Y (2010)
KEYWORDS: Scanners, Critical dimension metrology, Shape analysis, Optical proximity correction, Fiber optic illuminators, Semiconducting wafers, Lithography, Control systems, Instrument modeling, Process control

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742W (2009)
KEYWORDS: Polarization, Critical dimension metrology, Semiconducting wafers, Lithography, Optical lithography, Resolution enhancement technologies, Polarization control, Fiber optic illuminators, Semiconductors, Metrology

Proceedings Article | 4 December 2008 Paper
Ki-Yeop Park, Ho-young Kang, Gratiela Isai, Khalid Elbattay, Peter van Oorschot, Stuart Young, Seung-Chul Oh, Young-Hong Min, Sung-Goo Hong, Youn-Tak Park
Proceedings Volume 7140, 71403N (2008)
KEYWORDS: Polarization, Nanoimprint lithography, Photomasks, 3D image processing, 3D modeling, Chromium, 3D displays, Lithography, Computer simulations, Device simulation

Proceedings Article | 27 March 2007 Paper
Chanha Park, Jongkyun Hong, Kiho Yang, Thomas Theeuwes, Frederic Gautier, Young-Hong Min, Alek Chen, Hyunjo Yang, Donggyu Yim, Jinwoong Kim
Proceedings Volume 6520, 65204X (2007)
KEYWORDS: Polarization, Critical dimension metrology, Printing, Metrology, Line edge roughness, Reticles, Picosecond phenomena, Resolution enhancement technologies, Optical lithography, Semiconductors

Showing 5 of 11 publications
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