Young-Hong Min
Sr. Application Specialist at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Inspection, Computer simulations, Printing, Semiconducting wafers, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Scanners, Control systems, Process control, Shape analysis, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Instrument modeling, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, Polarization, Critical dimension metrology, Polarization control, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Polarization, Chromium, Computer simulations, 3D modeling, Photomasks, Nanoimprint lithography, 3D displays, Device simulation, 3D image processing

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Polarization, Printing, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Tolerancing

Showing 5 of 11 publications
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